Atomic Layer Deposition

Chairman:
Dr. Pierre Giovanni Mani González (UACJ), pierre.mani@uacj.mx

The purpose of this symposium is to provide a forum for the discussion about basic issues and the state of the art applications of atomic layer deposition (ALD).

The topics include:

• Simulation, Modeling and Theory of ALD
• Precursors and Chemistry
• Surface Functionalization
• Structural, chemical and electrical characterization.
• Growth and Nucleation in the Ultra-Thin Regime
• Novel Materials
• Plasma-Enhanced ALD
• Molecular Layer Deposition
• Others.