IX International Conference on
Surfaces, Materials and Vacuum
September 26th to 30th, 2016 Mazatlan, Mexico
Chairmen:
Dr. Pierre Giovanni Mani González: (UACJ),pierre.mani@uacj.mx
Dr. Eduardo Martínez Guerra: (CIMAV-Monterrey),eduardo.martinez@cimav.edu.mx
The purpose of this symposium is to provide a forum for the discussion about basic issues and state the art applications of atomic layer deposition (ALD). The topics include:
• Simulation, Modeling and Theory of ALD
• Precursors and Chemistry
• Surface Functionalization
• Structural, chemical and electrical characterization.
• Growth and Nucleation in the Ultra-Thin Regime
• Novel Materials
• Plasma-Enhanced ALD
• Molecular Layer Deposition
• Others.