Atomic Layer Deposition

Chairmen:
Dr. Edgard López Luna: (UASLP), edgar.luna@uaslp.mx
Dr. Pierre Giovanni Mani González: (UACJ),pierre.mani@uacj.mx
Dr. Hugo Tiznado:(CNYN-UNAM), tiznado@cnyn.unam.mx

The purpose of this symposium is to provide a forum for the discussion about basic issues and state the art applications of atomic layer deposition (ALD). The topics include:

 • Simulation, Modeling and Theory of ALD
 • Precursors and Chemistry
 • Surface Functionalization
 • Structural, chemical and electrical characterization.
 • Growth and Nucleation in the Ultra-Thin Regime
 • Novel Materials
 • Plasma-Enhanced ALD
 • Molecular Layer Deposition
 • Others.